Press Releases

SMIC and VERISILICON Announced Release of A Standard Design Platform For SMIC'S 0.13u Low Leakage Process

06 Sep 2006

For SMIC'S 0.13u Low Leakage Process
shanghai  [2006-09-06]

Library Release is Highly Optimized for Low Power, Low Leakage Applications

Shanghai, China, Sep. 6, 2006- VeriSilicon Holdings Co., Ltd. (VeriSilicon), a leading world class ASIC design foundry, semiconductor library and IP provider focusing on design and manufacturing services for customers worldwide, and Semiconductor Manufacturing International Corporation (SMIC) (NYSE: SMI; SEHK: 0981.HK), one of the leading foundry in the world jointly announced today the release of VeriSilicon's Standard Design Platform (SDP) for SMIC's 0.13um Low Leakage process. The SDP includes memory compilers for single port and dual port SRAM, Diffusion programmable ROM, Two-port Register File Compiler, standard cell library and I/O cell library.

This new SDP was optimized specifically for low leakage and low power, and has been proven in silicon through SMIC's 0.13um Low Leakage Silicon Shuttle Prototyping Service. In addition, the SDP supports industry-leading EDA tools, including Cadence, Synopsys, Magma and Mentor Graphics.

“Several hundred customers worldwide have used VeriSilicon’s Standard Design Platforms for their designs and many complex, multi-million gates SoCs have achieved first silicon success and started volume production.” said Dr. Wayne Dai, chairman, President and CEO of VeriSilicon, “We have developed low leakage and low power technologies for this newly released SDP, optimized specifically for SMIC 0.13um low leakage process; the technology can significantly reduce IC power consumption for optimal use in battery powered applications, such as handheld devices.”

“We thank VeriSilicon, one of our strategic partners’ continuous great support in the advancement of technology portfolio to serve our customers in China as well as in the world.“ said Richard Chang, President and CEO of SMIC, “At the fast moving speed of the technology development, SMIC aims to work closely with VeriSilicon to deliver the excellence of the cooperation to the forefront of technology."

About SMIC
SMIC (NYSE: SMI; SEHK: 981) is one of the leading semiconductor foundries in the world and the largest and most advanced foundry in Mainland China, providing integrated circuit (IC) manufacturing service at 0.35mm to 90nm and finer line technologies. Headquartered in Shanghai, China, SMIC operates three 200mm fabs in Shanghai and one in Tianjin, and one 300mm fab in Beijing, the first of its kind in Mainland China. SMIC has customer service and marketing offices in the U.S., Italy, and Japan as well as a representative office in Hong Kong. For additional information, please visit

About VeriSilicon
VeriSilicon Holdings Co., Ltd. is a leading world class ASIC design foundry providing libraries, semiconductor IPs, design and turnkey manufacturing services with multi-fab capability and on process technologies down to 90nm. VeriSilicon has achieved first silicon success and entered volume production of many complex, multi-million gates SoCs using the leading wafer foundries in APAC and China. VeriSilicon has operations in US, China, Taiwan, Japan, France, and Korea. Over 500 customers worldwide have licensed VeriSilicon IPs and Standard Design Platforms. In 2005, VeriSilicon was ranked number three in Deloitte Technology Fast 50 China, the top 50 fastest-growing technology companies in China and number six in Deloitte Fast 500 Asia Pacific, the top 500 fastest-growing technology companies in Asia Pacific. VeriSilicon was also named one of the Red Herring 100 Private Companies of Asia, and selected as one of the EE Times 60 Emerging Startups. For additional information, please visit

Safe Harbor Statements
(Under the U.S. Private Securities Litigation Reform Act of 1995)
Certain statements contained in this press release, such as statements regarding the ongoing cooperation between SMIC and VeriSilicon, may be viewed as "forward-looking statements" within the meaning of Section 27A of the U.S. Securities Act of 1933, as amended, and Section 21E of the U.S. Securities Exchange Act of 1934, as amended. Such forward-looking statements involve known and unknown risks, uncertainties and other factors (including without limitation the actual results of future cooperation between SMIC and VeriSilicon), which may cause actual events, and/or the actual performance, financial condition or results of operations of SMIC to be materially different from any future performance, financial condition or results of operations implied by such forward-looking statements. Further information regarding these risks, uncertainties and other factors is included in the Company's annual report on Form 20-F filed with the U.S. Securities and Exchange Commission (the "SEC") on June 29, 2006 and such other documents that SMIC may file with the SEC or The Stock Exchange of Hong Kong Limited from time to time.

For further information, contact:

SMIC Press Contacts:
SMIC Shanghai
Reiko Chang
SMIC Public Relations Department
+86 21 5080 2000 ext 10544

SMIC Hong Kong
Calvin Lau / Mei Fung Hoo
+852 9435 2603 / 2537 8480

Federico Arcelli
Corporate VP, WW Marketing, VeriSilicon
+33 4 97 10 01 38